Coordinator of S3 Nanofabrication Laboratory, an open facility equipped with a Dual Beam FIB-SEM and an EBL system. Primary research interests are about the nanofabrication by focused ion and electron beams. Within FIB nanolithography field, the main topics include: nanofabrication of holographic plates and slits for electron interference experiments, nanopatterning of surfaces and thin films for nanomagnetism and nanotribology studies, fabrication of nanogap electrodes and manganite spintronic devices, scanning probe tips modification. Regarding electron-beam nanofabrication, the key topic is focused electron beam-induced deposition (FEBID) of nanowires from metal, insulating and magnetic gas precursors, characterized from a structural and electrical viewpoint.

Research interest in requiring FIB preparation methods (e.g. for TEM analysis), and FIB-SEM cross-section analysis. Research activity before entering S3 center (2003) was focused onto the physical processes at the basis of electron diffraction inside crystalline surfaces and thin films and on the structural characterization of ultrathin epitaxial films of magnetic elements.