Aurelia Mandes has completed her PhD from PhD School at Physics Faculty from Bucharest University Romania. She is a Post-Doctoral Researcher at Ovidius University, Faculty of Applied Sciences and Engineering, ConstanÅ£a, Romania. She has published more than 24 papers in reputed international journals (J Appl Phys, Contrib Plasma Phys, - Eur. Phys. J. D) and three Chapters in books at Wiley – VCH Publisher 2010, NOVA Publisher 2012 and IN TECH Publisher 2016. She has expertise in deposition and characterization of nanostructured thin films obtained by the Thermionic Vacuum Arc (TVA) technology. Aurelia Mandes has completed her PhD from PhD School at Physics Faculty from Bucharest University Romania. She is a Post-Doctoral Researcher at Ovidius University, Faculty of Applied Sciences and Engineering, ConstanÅ£a, Romania. She has published more than 24 papers in reputed international journals (J Appl Phys, Contrib Plasma Phys, - Eur. Phys. J. D) and three Chapters in books at Wiley – VCH Publisher 2010, NOVA Publisher 2012 and IN TECH Publisher 2016. She has expertise in deposition and characterization of nanostructured thin films obtained by the Thermionic Vacuum Arc (TVA) technology.

Applied Sciences and Engineering